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Posted: May 31st, 2012 GLOBALFOUNDRIES Silicon Validates 28nm AMS Production Design;Reveals Digital and AMS Support for Double Patterning at 20nm ( Nanowerk News ) At next week's Design Automation Conference (DAC) in SanFrancisco, Calif., GLOBALFOUNDRIES plans to demonstrate an enhancedsilicon-validated design flow for its 28nm Super Low Power (SLP)technology with Gate First High-k Metal Gate (HKMG). The flowprovides proven and complete front-to-back support for advancedanalog/mixed-signal (AMS) design using the industry's latest designautomation technology. In addition, the company will reveal jointlydeveloped design flows with its EDA partners in certifying bothanalog and digital "double patterning aware" flows for its 20nmprocess, with silicon validation expected in early 2013 at thattechnology node. As a result of GLOBALFOUNDRIES' commitment to silicon validation offlows before releasing them, customers have the confidence toproduce signoff-ready 28nm digital and analog designs using theindustry's most advanced set of design tools, tool scripts, andmethodologies from the leading EDA suppliers. The company's tightcollaboration with the design tool and IP ecosystem alsoaccelerates its ability to develop working flows for advanced nodessuch as 20nm, providing their advantages in gate density,performance, and lower power to customers ahead of other foundries. "Our approach to early collaborative development work with ourdesign enablement partners continues to keep us at the leading-edgeof process technology and deliver proven and reliable solutions tocustomers," said Mojy Chian, senior vice president of designenablement at GLOBALFOUNDRIES. "At 28nm, and even more so at 20nm,process technology and design tool flows must be in lock step inorder to address the significant design-to-manufacturing challengesthat arise. We work closely with our partners to identifyinnovative approaches to deal with challenges such as timingvariations for digital ICs and layout dependent effects in customchips. These most recent flows demonstrate the strength of ourmodel, as well as the innovation and expertise required to offerfoundry solutions at this level." Enhanced flow support at 28nm The GLOBALFOUNDRIES 28nm AMS production flow is a Mixed Vendor Flowsupporting tools from multiple vendors, including Cadence DesignSystems for layout with Virtuoso technology; Synopsys and Cadencefor parasitic extraction; and Mentor Graphics for physicalverification. The flow is a truly integrated mixed-signal flow withcomplete support for a digital implementation module based on theEncounter Digital Implementation System from Cadence. This provenapproach enables the integration of analog IP into a digital SOCdesign using production standard cells. In addition, the flow now includes inductor synthesis andextraction support from specialized EDA suppliers LorentzSolutions, Helic and Integrand Software. The flow has also beenaugmented with support for fast variation-aware analysis using theVariation Designer platform from Solido Design Automation, andEM/IR analysis using the Totem software platform from ApacheDesign. A DRC waiver flow is available from Mentor Graphics'Calibre tool suite. The 28nm AMS Production Design flow is fully validated with siliconresults from an analog design with validated functionality from300MHZ up to 3Ghz. Silicon validation included clock duty cycle,peak-to-peak period jitter and operating current for key analogblocks. The 28nm flow leverages GLOBALFOUNDRIES' heritage as a leader inDesign-for-Manufacturing (DFM) by supporting DRC+, the company'ssilicon-validated solution that goes beyond standard Design RuleChecking (DRC) and uses two-dimensional shape-basedpattern-matching to enable up to a 100-fold speed improvement inidentifying complex manufacturing issues without sacrificingaccuracy. As part of the design flow support, customers receive the entiredesign database, detailed documentation and executable flowscripts, and also a report on the testing results of themanufactured silicon. The flows are fully integrated with the PDKand maintained and supported by GLOBALFOUNDRIES. Enabling double patterning at 20nm At 20nm, GLOBALFOUNDRIES and its design enablement partners havefocused on critical new manufacturability issues, including thelimits of traditional lithography and the need for even more robustDFM techniques. A key requirement is double patterning. We are high quality suppliers, our products such as Double Shaft Shredder Manufacturer , Scrap Cable Stripper Manufacturer for oversee buyer. To know more, please visits Copper Wire Recycling Machine.
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