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Applied materials introduces critical ion implant technology forscaling future chips by fdhjkl rfghjtkl





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Applied materials introduces critical ion implant technology forscaling future chips by
Article Posted: 09/28/2013
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Applied materials introduces critical ion implant technology forscaling future chips


 
Business,Business News,Business Opportunities
Posted: Jun 6th, 2012 Applied Materials Introduces Critical Ion Implant Technology forScaling Future Chips ( Nanowerk News ) Applied Materials, Inc. today announced its new Applied VarianVIISta® Trident system, the semiconductor industry's mostadvanced single-wafer, high-current ion implant system. Used toengineer the electrical characteristics of the chip by embedding"dopant" atoms, the new VIISta Trident system is the only ionimplanter proven to achieve the yields necessary for manufacturinghigh-performance, power-efficient logic chips at the 20nm node. At the 20nm node, optimizing dopant activation and suppressingdefects in the extension, source/drain junction and contact regionsbecome significant challenges that impede the scaling of highperformance transistors. The unique capability of the VIIStaTrident system to precisely tailor dopant concentration and depthprofile is critical to optimizing performance, controlling leakagecurrent and reducing variability in advanced devices.

"A typical advanced logic chip requires as many as 60 implantsteps, including co-implant and precision materials modificationapplications - many of which are critical to device performance.The precision of our VIISta Trident technology is vital to helpingour customers achieve profitable yields on their leading-edgedesigns," said Bob Halliday, vice president and general manager ofApplied's Varian business unit. "This benchmark performancestrengthens Applied's leadership position in providing ourcustomers with leading-edge transistor fabrication solutions. Allmajor foundries fabricating 20nm chips today are using our VIIStaTrident systems as tool of record." Key to the superior performance of the Trident system is itsproprietary dual-magnet ribbon beam architecture for enhanced lowenergy performance. The system's Energy Purity Module virtuallyeliminates damaging, high-energy species that can "smear" thecritical transistor channel and lead to increased current leakageand degraded performance.

Integrated cryogenic technology enables production implants as lowas -100 C, providing superior process control for transistormatching. This is particularly vital for making embedded SRAM cellsfor on-chip cache memory, where the six or eight transistors thatmake up each cell must be precisely matched to enable reliableswitching at the low operating voltages required for mobilecomputing. To learn more about the technology behind Applied's Varian VIIStaTrident system, visit/technologies/library/varian-viista-trident. The Trident system is one of several important technologies beingannounced by Applied in connection with SEMICON West 2012 - to beheld on July 10-12 in San Francisco, Calif.

More information can befound at Applied's online booth atbecauseinnovationmatters, whichwill be updated regularly before and during the show. About Applied Materials Applied Materials, Inc. is a global leader in providing innovativeequipment, services and software to enable the manufacture ofadvanced semiconductor, flat panel display and solar photovoltaicproducts. Our technologies help make innovations like smartphones,flat screen TVs and solar panels more affordable and accessible toconsumers and businesses around the world. At Applied Materials, weturn today's innovations into the industries of tomorrow.

Learnmore at .

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